1. Introduction & Industry Context
In the semiconductor manufacturing industry, lithography remains one of the most critical and capital-intensive processes. Nikon’s SF series steppers, particularly the NSR-SF120 and NSR-SF130, have earned a reputation for stability, reliability, and cost-effectiveness.
Although these models are no longer the latest generation, they continue to serve an important role in mature-node production lines, research facilities, and as complementary tools in mix-and-match lithography strategies.
For fab engineers, procurement managers, and maintenance teams, understanding the technical strengths and operational considerations of these models is essential before purchasing a used unit or planning a refurbishment project.
2. Model Overview & Key Differences
The Nikon SF120 and SF130 belong to the i-line stepper family, designed for exposure wavelengths around 365 nm. Both were introduced as high-throughput, stable systems targeting non-critical layers in wafer fabrication. However, they differ in optical performance, throughput, and the specific process layers they best serve.
Below is a concise comparison of their key specifications:
| Feature | Nikon SF120 | Nikon SF130 |
|---|---|---|
| Release Year | 1990s | Early 2000s |
| Exposure Wavelength | i-line (365 nm) | i-line (365 nm) |
| Numerical Aperture (NA) | ~0.45 | ~0.50 |
| Max Wafer Size | 200 mm | 200 mm |
| Throughput* | ~90 wafers/hour | ~100 wafers/hour |
| Typical Use | Non-critical layers, mature-node production | Higher overlay accuracy, faster cycle times |
| Common Process Node | ≥ 0.35 μm | ≥ 0.25 μm |
*Throughput values depend on process conditions and tool configuration.
This side-by-side view highlights that while both tools are excellent for stable production, the SF130 offers incremental improvements in resolution and throughput, making it more suitable for slightly tighter overlay requirements.
3. Technical Architecture
Both the SF120 and SF130 are built on Nikon’s robust stepper platform, integrating precision optics with highly accurate stage control systems. Key architectural features include:
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Optical System: High-quality projection lenses optimized for i-line lithography, ensuring uniform illumination and excellent CD (critical dimension) control.
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Stage & Alignment: Precision wafer stage with interferometer-based positioning, delivering sub-micron alignment accuracy across the exposure field.
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Automation: Motorized reticle loaders, wafer handling robots, and SMIF pods for controlled, particle-free wafer transport.
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Control Electronics: Proprietary Nikon control software and hardware for recipe management, system diagnostics, and performance monitoring.
These design elements make the SF series reliable workhorses for production environments that demand both consistency and ease of maintenance.
4. Applications & Process Role
The SF120 and SF130 are not intended to compete with modern DUV or EUV scanners for leading-edge nodes; instead, they excel in areas where cost efficiency, reliability, and predictable performance are paramount. Common application scenarios include:
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Non-Critical Layer Exposures: Such as interconnect layers, contact/via openings, and passivation layers.
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Mature-Node High-Volume Manufacturing: Supporting technology nodes of 0.25 μm to 0.5 μm and above.
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Mix-and-Match Strategy: Working alongside more advanced scanners for critical layers, while handling less demanding layers to optimize overall fab throughput.
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R&D and Pilot Lines: Providing stable performance for small-lot, experimental, or educational environments.
In these contexts, the SF120 and SF130 provide a cost-effective balance between performance and operational cost, especially when sourced, refurbished, and maintained by an experienced supplier.
5. Buying Used Equipment — Key Considerations
When sourcing a used Nikon SF120 or SF130, careful evaluation is critical to ensure the tool meets your production and quality requirements. Buyers should focus on three main areas:
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System Specifications — Verify the exact configuration, including numerical aperture, maximum exposure field size, and control software version.
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Operational History — Request maintenance logs, decontamination records, and past process recipes to understand wear patterns.
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Current Condition — Inspect optics for contamination, assess stage performance, and verify wafer handling systems.
A detailed acceptance test should include:
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Overlay accuracy measurement
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Critical dimension (CD) uniformity check
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Throughput verification under real process conditions
This proactive approach minimizes unexpected downtime and helps negotiate fair pricing based on the system’s true condition.
6. Refurbishment & Testing Process
Refurbishment is more than just cleaning — it’s a structured process to restore the tool to near-original performance. At JUNR, the workflow typically includes:
Step 1 — Deinstallation & Transport
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Controlled cleanroom removal to prevent contamination
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Secure crating for vibration and ESD protection
Step 2 — Disassembly & Inspection
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Detailed inspection of optics, stages, and control boards
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Identification of worn or damaged parts
Step 3 — Replacement & Calibration
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Installation of OEM or high-quality equivalent spare parts
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Optical realignment and stage calibration
Step 4 — Functional Testing
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Exposure uniformity mapping
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Overlay/registration accuracy tests
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Throughput stress testing
Step 5 — Final Acceptance & Certification
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Delivery of test reports and performance certification to the customer
This method ensures that refurbished SF120 and SF130 systems are production-ready from day one.
7. Spare Parts & Upgrade Possibilities
Maintaining a Nikon SF120 or SF130 in production requires a dependable supply of spare parts. Key components to monitor include:
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Lamps or Light Source Modules
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Stage Encoders & Motion Controllers
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Vacuum Pumps & Seal Kits
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Slit Valves & Wafer Handling Arms
In many cases, upgrades can extend the useful life of these systems:
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Retrofitting modern controllers for better process integration
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Upgrading automation to improve wafer throughput
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Installing more efficient light sources to reduce operational costs
JUNR’s extensive network ensures rapid sourcing of both original and compatible parts, minimizing downtime.
8. Conclusion & JUNR Service Offering
The Nikon SF120 and SF130 remain valuable assets in semiconductor manufacturing, especially for fabs seeking a balance between performance and cost efficiency. With proper inspection, refurbishment, and support, these tools can deliver stable, high-quality lithography for many more years.
At Wuxi Junr Technology Co., Ltd., we specialize in:
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Sourcing high-quality used Nikon SF series steppers
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Full refurbishment with OEM-grade calibration
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Supplying critical spare parts from a well-stocked inventory
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On-site installation, training, and long-term maintenance contracts
By combining technical expertise with a global supply chain, JUNR ensures that each customer receives not only a reliable tool but also the ongoing support needed for continuous production success.
