Novellus C1 manual | Refurbished Solutions by JUNR

1. Introduction to Novellus C1

The Novellus C1 is a plasma-enhanced chemical vapor deposition (PECVD) system widely used in semiconductor manufacturing. Originally developed by Novellus Systems, which later became part of Lam Research, the C1 was designed to deliver reliable thin-film deposition for front-end and back-end wafer processes.

Although the system was first introduced in the late 1990s, it continues to hold a strong reputation among semiconductor fabs around the world. This is largely due to its robust process control, uniform deposition capability, and extended equipment lifecycle. Even today, many fabs—particularly those handling 150 mm and 200 mm wafer production—still rely on the Novellus C1 as a cost-effective workhorse for dielectric and passivation processes.

2. Core Features of the Novellus C1

The Novellus C1 is recognized for its balance of performance, stability, and affordability. Below are its key features that make it a trusted solution in wafer fabrication:

• Plasma Enhanced CVD Technology

  • ● Supports a wide range of dielectric films, including SiO₂, Si₃N₄, and low-k dielectrics.

  • ● Enables precise tuning of film properties such as stress, refractive index, and dielectric constant.

• Single-Wafer Chamber Design

  • ● Provides superior film uniformity across wafers, reducing defect density.

  • ● Helps fabs maintain process consistency across multiple production runs.

• Automation and Wafer Handling

  • ● Equipped with robotic wafer transfer for minimal contamination.

  • ● Capable of handling high-throughput production with excellent repeatability.

• Advanced Process Control

  • ● Recipe customization for specific applications (logic, memory, R&D).

  • ● Inline monitoring for thickness, uniformity, and stress control.

• Proven Reliability

  • ● Decades of proven uptime performance in fabs worldwide.

  • ● Supported by an active secondary market for spare parts and technical services.

3. Technical Specifications of Novellus C1

The following table highlights the general specifications of the Novellus C1 PECVD system. (Note: parameters can vary slightly depending on system configuration and upgrades.)

The combination of flexible process recipes, reliable hardware design, and stable repeatability makes the Novellus C1 a popular choice for fabs that require consistent performance without the higher capital costs of newer-generation PECVD tools.

4. Applications of the Novellus C1

The Novellus C1 PECVD system has been widely adopted in both R&D laboratories and production fabs for a variety of semiconductor applications. Its flexibility allows it to serve across multiple technology nodes and industries:

• Logic and Memory Devices

  • ● Deposition of interlayer dielectrics, passivation films, and stress-engineered films.

• MEMS (Micro-Electro-Mechanical Systems)

  • ● Protective coatings and dielectric films required for MEMS sensors and actuators.

• Power Devices

  • ● Deposition of thick dielectric layers and passivation films for improved breakdown strength.

• LED & Optoelectronics

  • ● Dielectric coatings for optical isolation, passivation, and improved device stability.

• Specialty Applications

  • ● R&D applications requiring tunable film properties (stress, refractive index, porosity).

  • ● Universities and research labs focusing on new material development.

This versatility makes the Novellus C1 a practical choice for fabs and institutions that want one platform to handle multiple processes.

5. Advantages of Using Novellus C1

Compared to newer PECVD platforms, the Novellus C1 continues to be attractive for organizations that prioritize cost efficiency, reliability, and proven performance.

Key Advantages

• Cost-Effective Operation

  • ● Lower capital cost compared to modern PECVD tools.

  • ● Wide availability of refurbished units and spare parts.

• Process Stability

  • ● Demonstrated long-term reproducibility across multiple process generations.

  • ● Low downtime and predictable preventive maintenance cycles.

• Flexibility Across Materials

  • ● Capable of handling standard and advanced dielectrics, including low-k films.

  • ● Adjustable stress and thickness profiles for diverse applications.

• Strong Secondary Market Support

  • ● Many service providers and equipment resellers continue to supply parts, upgrades, and process recipes.

  • ● Operators benefit from a large installed base worldwide.

6. Refurbished Value and Availability

While newer PECVD systems dominate leading-edge fabs, the refurbished Novellus C1 remains a smart investment for companies that do not require cutting-edge nodes.

Why Choose a Refurbished Novellus C1?

• 1. Lower Total Cost of Ownership (TCO) – Substantially reduced capital investment compared to new equipment.

• 2. Proven Technology – Decades of fab-proven reliability and process stability.

• 3. Sustainability – Extending equipment lifecycle reduces e-waste and aligns with green manufacturing goals.

• 4. Readily Available Support – Spare parts, consumables, and repair services are widely accessible.

Example of Market Availability

Conclusion

The Novellus C1 PECVD system is more than just a legacy tool—it remains a cost-effective, flexible, and reliable solution for fabs and research facilities worldwide. With strong support in the secondary market and a proven record of process stability, it continues to be a valuable platform for dielectric film deposition and specialty applications.

At Wuxi JUNR Technology Co., Ltd., we specialize in second-hand semiconductor equipment, including refurbished Novellus C1 systems. Our team provides not only the hardware but also technical support, spare parts, and process consultation to help fabs maximize their investment.

If your fab or lab is considering a refurbished Novellus C1 PECVD system, feel free to reach out to us for availability and expert consultation.