1. Introduction: Nikon’s Legacy in Lithography
For more than four decades, Nikon Corporation has been one of the world’s leading providers of photolithography equipment. The company’s NSR (Nikon Step-and-Repeat) series has been instrumental in advancing wafer exposure technology across generations of semiconductor manufacturing.
Among the KrF (248 nm) steppers developed by Nikon, the NSR-S206D represents a mature yet highly reliable platform that continues to see active use in 200mm and 300mm wafer fabs. Originally introduced for critical layers at technology nodes around 130–250 nm, it remains a popular choice today in analog IC, MEMS, and power semiconductor production, where precision and throughput matter more than ultra-fine geometries.
In recent years, the used equipment market has seen a growing demand for refurbished Nikon NSR steppers — especially the S206D — as manufacturers look to balance cost and performance for mature-node fabrication.
2. Overview of the Nikon NSR-S206D
The Nikon NSR-S206D Stepper is part of Nikon’s KrF (248 nm) lithography lineup, designed for volume production of advanced 200mm and 300mm wafers. It combines high-resolution projection optics with a stable mechanical platform and precise alignment systems, making it a proven workhorse for semiconductor manufacturers.
Key Highlights:
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Exposure Wavelength: 248 nm (KrF Excimer Laser)
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Wafer Size: 200 mm / 300 mm
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Resolution: ~130 nm
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Overlay Accuracy: ±25 nm
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Throughput: Up to 120 wafers per hour
The system integrates Nikon’s advanced autofocus and leveling system, ensuring accurate pattern transfer even across topographically challenging wafers. Its stage motion control and laser alignment subsystems are engineered for repeatability, stability, and consistent overlay precision.
The NSR-S206D also supports automated wafer handling and SECS/GEM communication standards, allowing it to integrate smoothly into both legacy and modern fab environments.
3. Technical Specifications
Below is a summary of the core technical parameters of the Nikon NSR-S206D, along with a comparison to earlier models in the same family:
| Specification | Nikon NSR-S206D | Nikon NSR-S205C | Nikon NSR-S204B |
|---|---|---|---|
| Exposure Source | KrF Excimer Laser (248 nm) | KrF Excimer Laser (248 nm) | KrF Excimer Laser (248 nm) |
| Wafer Size | 200 mm / 300 mm | 200 mm | 200 mm |
| Resolution | ~130 nm | ~150 nm | ~180 nm |
| Overlay Accuracy | ±25 nm | ±30 nm | ±35 nm |
| Throughput | ~120 wafers/hour | ~100 wafers/hour | ~90 wafers/hour |
| Alignment Method | TTL / Laser Interferometer | TTL | TTL |
| Focus Control | Dynamic Autofocus & Leveling | Standard Autofocus | Manual / Semi-auto |
| Typical Node | 130–250 nm | 180–250 nm | 250–350 nm |
This table highlights the incremental optical and mechanical improvements Nikon made in the S206D — particularly in resolution, overlay accuracy, and automation capability. These advances make it not only a stable production tool but also a preferred platform for wafer-level R&D and pilot production.
4. Key Features and Advantages
The Nikon NSR-S206D was designed to deliver stability, precision, and high productivity for advanced 200mm and 300mm wafer processing. Below are its most notable features and the advantages they offer for today’s semiconductor manufacturers.
4.1 Advanced Optical System
At the heart of the NSR-S206D lies Nikon’s KrF projection lens system. With a wavelength of 248 nm, the stepper achieves a minimum resolution of approximately 130 nm, suitable for critical layers of mature technology nodes. The lens design emphasizes low aberration and high uniformity across the entire exposure field — ensuring sharp, repeatable imaging even during long production runs.
4.2 Precise Stage and Alignment Control
The tool incorporates Nikon’s twin-stage wafer handling system, featuring laser interferometer-based position feedback. This allows for real-time correction and sub-25-nanometer overlay accuracy. Combined with Nikon’s dynamic autofocus and leveling technology, the NSR-S206D consistently maintains pattern integrity even on slightly warped wafers.
4.3 High Throughput and Automation
Capable of processing up to 120 wafers per hour, the NSR-S206D maintains strong throughput without sacrificing accuracy. Its integration with SECS/GEM standards enables seamless communication with fab control systems, making it compatible with both fully automated production lines and pilot environments.
4.4 Long-Term Reliability
Built with robust mechatronics and a modular architecture, the NSR-S206D is renowned for its low downtime and long operational lifespan. Many systems installed over a decade ago are still active in fabs worldwide — a testament to Nikon’s engineering excellence and the machine’s ease of maintenance.
4.5 Cost-Effective for Mature Nodes
For manufacturers operating at 130–250 nm nodes, this system offers an excellent cost-to-performance ratio. In mature-node markets — such as MEMS, analog ICs, and power semiconductors — it continues to be one of the most efficient steppers available on the used market.
5. Applications in Today’s Semiconductor Industry
While the Nikon NSR-S206D is no longer a cutting-edge EUV or ArF immersion system, its value lies in reliability, affordability, and versatility. It plays a critical role in several high-demand manufacturing segments.
5.1 MEMS and Sensor Fabrication
MEMS (Micro-Electro-Mechanical Systems) and image sensors require robust photolithography at relatively large geometries. The NSR-S206D’s high overlay precision and stable illumination make it ideal for these production lines.
5.2 Analog and Power Devices
For analog ICs and power semiconductors, process uniformity is more important than resolution. The NSR-S206D provides a balanced combination of accuracy, repeatability, and cost control, making it a common choice for power management ICs, diodes, and motor control chips.
5.3 R&D and Pilot Production
Research labs and small-volume fabs often adopt the NSR-S206D for process development, device prototyping, and wafer-level packaging experiments. Its flexible configuration and stable performance allow researchers to test multiple layer stacks with consistent results.
6. Used Market Overview
The secondary semiconductor equipment market has seen a steady increase in demand for Nikon NSR-S206D steppers. As 200mm wafer production continues to expand — especially in China, Southeast Asia, and Eastern Europe — the NSR-S206D remains a cost-efficient tool for expanding fab capacity.
6.1 Availability
Refurbished and fully functional units are regularly traded through professional resellers like JUNR Semiconductor Equipment Co., Ltd., which specializes in sourcing, testing, and refurbishing used lithography systems from top brands such as Nikon, Canon, and ASML.
6.2 Pricing Trends
Compared to new-generation immersion tools, the NSR-S206D offers substantial savings — typically 70–85% lower cost, depending on condition and service history. These economics make it particularly attractive for fabs focusing on legacy or specialty device production.
6.3 Quality Refurbishment and Testing
Reputable resellers perform detailed calibration, optics cleaning, stage realignment, and system-level testing before shipment. JUNR, for example, provides performance verification and installation support, ensuring each unit meets operational specifications before delivery.
7. Maintenance and Support
Regular maintenance and timely part replacement are essential for keeping the Nikon NSR-S206D running at optimal performance. Due to its widespread use and long production life, most critical spare parts are still available through the used equipment ecosystem and trusted suppliers.
7.1 Preventive Maintenance Schedule
A typical NSR-S206D maintenance plan includes:
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Daily: Lens cleaning, purge gas verification, and stage calibration check.
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Weekly: Autofocus and alignment calibration, illumination uniformity test.
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Monthly: Vacuum system check, excimer laser gas replacement, cooling line inspection.
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Quarterly / Yearly: Stage motor lubrication, linear encoder recalibration, and firmware update.
7.2 Common Spare Parts and Modules
The following components are frequently replaced or refurbished during servicing:
| Component | Function | Maintenance Note |
|---|---|---|
| Projection Lens Module | Image projection and focus | Requires periodic cleaning and optical inspection |
| Alignment System Board | Controls wafer alignment and overlay | Often recalibrated during preventive maintenance |
| Excimer Laser Tube | Light source for exposure | Typical lifetime: 2,000–3,000 hours |
| Stage Motor / Encoder | Wafer stage positioning | Must be verified for stability and backlash |
| Temperature & Vacuum Sensors | Process stability | Replace if drift exceeds tolerance |
With the right maintenance schedule, many NSR-S206D systems have achieved 15+ years of reliable operation in production environments.
7.3 Technical Support Resources
JUNR’s engineering team offers remote diagnostics, spare part sourcing, and on-site installation services for Nikon steppers. Our expertise covers mechanical, optical, and electronic subsystems, ensuring that every refurbished unit performs to factory-level standards.
8. Why Choose JUNR for Used Nikon Steppers
At JUNR Semiconductor Equipment Co., Ltd., we specialize in supplying and maintaining used Nikon lithography systems, including the NSR-S206D, S205C, and S306C series.
8.1 Deep Market Experience
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Over 10 years of experience in the semiconductor equipment industry.
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Proven expertise in sourcing, refurbishing, and exporting used steppers worldwide.
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Strong relationships with fabs, brokers, and OEM engineers.
8.2 Comprehensive Service
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Full System Refurbishment: Optical calibration, vacuum alignment, and performance verification.
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Global Support: Technical consultation, spare part supply, and logistics handling.
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Transparent Documentation: Each system comes with detailed test reports and service records.
8.3 Customer Segments Served
Our clients include:
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Foundries producing analog, MEMS, and power devices.
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Academic and R&D institutes needing stable, proven steppers.
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International equipment resellers seeking verified, high-condition units.
9. Conclusion
The Nikon NSR-S206D Stepper stands as one of the most reliable KrF lithography systems in semiconductor history. With its 130-nm resolution, ±25 nm overlay precision, and robust automation, it remains a cornerstone tool for mature-node manufacturing and MEMS or power device production.
Even as leading-edge fabs move toward EUV technology, the NSR-S206D continues to support global production capacity at an affordable cost. For companies seeking to expand or maintain 200 mm and 300 mm wafer lines, investing in a refurbished Nikon NSR-S206D from a trusted supplier like JUNR offers exceptional value, proven reliability, and complete technical support.
Contact JUNR today to learn more about available Nikon NSR-S206D systems, refurbishment options, and international delivery programs.
