TEL MARK8 System
As a long-term service provider in semiconductor lithography equipment, I have worked with the TEL Clean Track™ MARK series for many years. Among the classic 200 mm photoresist coating/developing systems, the TEL MARK8 remains one of the most stable and widely used platforms in both foundries and advanced packaging lines. Below is a comprehensive technical explanation based on our real engineering experience with installation, refurbishment, process verification and after-sales support.
1. System Configuration Overview
✔ 200 mm Wafer Configuration
The robot, aligner, spin chucks, hotplates, cup size and recipes are all designed specifically for 200 mm wafers. A key benefit of TEL’s 200 mm architecture is its high mechanical stability and long-term repeatability.
✔ Dual Coat & Dual Develop Stations
This configuration is commonly used in lines that:
• require higher throughput
• run multiple resist types
• separate critical and non-critical layers
• reduce queue time before bake/develop
Each station has its own spin motor, dispense system, cup, EBR control, nitrogen purge and solvent exhaust path. Dual stations significantly reduce cross-contamination risks.
✔ Carrier Station (C/S) 1×4 Side Load
A 1×4 SMIF or open-cassette side-load configuration is typical for production floors with limited footprint.
The carrier station includes:
• wafer presence sensors
• mapping function
• anti-static design
• wafer-to-robot handoff platform
This module is crucial for stable cassette handling, especially for old fabs with mixed cassette conditions.
✔ M12 Process Frame with Main Arm
The M12 frame is the core mechanical structure that houses the robot arm, aligner and transfer modules.
Features include:
• linear guide rails
• precise servo control
• vibration-suppressed frame base
• fully integrated interlock and sensors
The main robot arm is responsible for:
• picking wafers from the C/S
• delivering them to coat, bake and develop stations
• maintaining precise transfer height and alignment
This robot generation is known for its reliability and long service life.
✔ Environmental Enclosure with ULPA Filtration
The MARK8 uses a closed environmental chamber with:
• ULPA filters
• controlled airflow direction
• solvent exhaust system
• predictable thermal stability
This structure minimizes particle contamination and ensures the resist film uniformity is not affected by external airflow turbulence.
2. How the MARK8 Works
Below is the typical lithography track sequence inside a MARK8. I’ll describe it based on actual operation:
Step 1: Wafer Loading & Mapping
• Robot picks wafer from the 1×4 carrier station
• Pre-alignment is performed
• The system checks flat or notch orientation
Step 2: Photoresist Coating (Coat Module)
A resist coating cycle generally includes:
• center alignment
• controlled resist dispense
• multi-stage spin profile (slow spread → high-speed uniforming)
• EBR (edge bead removal)
• backside cleaning
• nitrogen drying
The dual coat configuration allows independent recipes for different product layers.
Step 3: Soft Bake / Pre-Exposure Bake
The wafer moves to a hotplate tower where temperatures are precisely controlled.
Features:
• independent plate temperature calibration
• programmable ramp and hold stages
• real-time temperature monitoring
Good bake control reduces standing wave effects and improves CD uniformity.
Step 4: Exposure (External Tool)
After soft bake, the wafer is transferred externally to a stepper/scanner.
Step 5: Develop Module
Once exposed, the wafer returns to MARK8 for development.
A typical develop cycle includes:
• puddle dispense
• soak timing
• multi-step develop flow control
• DIW rinse
• spin dry
Dual develop stations allow segregation of different developer chemistries or different development processes.
Step 6: Post-Develop Bake / Cooling
To stabilize the developed resist profile:
• PEB and cooling plates complete the structural stabilization
• Moisture control helps ensure consistent line-width performance
Step 7: Wafer Unloading
The wafer is sent back to the carrier station for further inspection or etching.
3. Key Advantages of the MARK8 Platform
1) Long-Term Mechanical Stability
The MARK8 is well-known for maintaining stable spin performance even after years of operation when properly maintained.
2) Mature & Wide Industry Adoption
Because thousands of units exist globally, spare parts, process knowledge and maintenance experience are abundant.
3) Flexible Upgrade & Retrofit Options
Many fabs operate MARK8 tools with:
• updated PLCs
• modern dispense systems
• new bake controllers
• 200 mm conversion kits
This is why the MARK8 continues to be viable in 2025.
4) High Contamination Control
ULPA filtering and a sealed process chamber provide stable particle control even in mixed-class cleanrooms.
5) Modular, Easily Serviceable Design
Technicians can access modules independently without dismantling the whole tool, greatly reducing MTTR.
4. Engineering Considerations When Using a Used/Refurbished MARK8
I include this section because many customers purchase refurbished 200 mm equipment.
✔ Robot & Arm Bearings
Check robot backlash, servo calibration and arm vacuum integrity.
✔ Spin Motor Health
Check vibration level, motor noise, spin speed accuracy and cup integrity.
✔ Bake Plate Calibration
Temperature drift is common in older plates; recalibration is essential.
✔ Developer Flow Stability
Developer nozzles, filters and flow sensors may need replacement.
✔ Enclosure Condition
ULPA filter life, panel sealing and airflow uniformity directly affect coating quality.
✔ Software Version Consistency
Different MARK8s in the market carry different software revisions; compatibility is important for recipe libraries and diagnostics tools.
This is the practical checklist we use during equipment evaluation and refurbishment.
5. Maintenance Best Practices
Daily Checks
• robot vacuum
• spin cup contamination
• resist/developer tank levels
• exhaust and airflow status
Weekly Checks
• hotplate surface cleaning
• dispense nozzle cleaning
• backside rinse performance
Monthly Checks
• ULPA filter pressure
• robot servo tuning check
• aligner calibration
• developer flow calibration
With proper maintenance, a MARK8 can run smoothly for more than 20 years.
6. Final Remarks — Our Professional Perspective
From an engineering standpoint, the TEL MARK8 remains a reliable, stable and process-friendly 200 mm coater/developer system.
Its:
• dual-coat / dual-develop configuration
• M12 process frame
• precise robotic handling
• ULPA-controlled enclosure
make it suitable for both R&D and mass-production environments where consistency and cost-effectiveness matter.
At Wuxi Junr Technology Co., Ltd. (JUNR), we handle MARK-series equipment regularly — including disassembly, relocation, installation, process verification, refurbishment and spare parts supply. Our focus is always on technical correctness and real engineering value, rather than sales language.
If you need further technical documents, a printable datasheet, or a version adapted to your website layout, I can prepare it for you anytime.
